Precise Measurement of HF, HCl and NH₃ Concentration in Semiconductor Processes Using Wavelength Modulation Spectroscopy
Aran Song; Jeongwoo Ha; Jungho Hwang; Daehae Kim; Miyeon Yoo; Changyeop Lee
- Published
- Publisher
- The Korean Institute of Gas
- Journal / collection
- JOURNAL OF THE KOREAN INSTITUTE OF GAS
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.7842/kigas.2026.30.1.8
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Cite this source
Aran Song; Jeongwoo Ha; Jungho Hwang; Daehae Kim; Miyeon Yoo; Changyeop Lee. Precise Measurement of HF, HCl and NH₃ Concentration in Semiconductor Processes Using Wavelength Modulation Spectroscopy. JOURNAL OF THE KOREAN INSTITUTE OF GAS. 2026-03-31. https://doi.org/10.7842/kigas.2026.30.1.8