Oxygen reduction for p-type TeOx thin-film transistor
Seiichi Kato; Masayuki Okamura; Tomomi Sawada; Toshihide Nabatame; Kazuhito Tsukagoshi
- Published
- Publisher
- AIP Publishing
- Journal / collection
- Applied Physics Letters
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1063/5.0329188
The original publisher provides the full text and its access options.
Cite this source
Seiichi Kato; Masayuki Okamura; Tomomi Sawada; Toshihide Nabatame; Kazuhito Tsukagoshi. Oxygen reduction for p-type TeOx thin-film transistor. Applied Physics Letters. 2026-05-25. https://doi.org/10.1063/5.0329188