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Spec-driven Design and Verification of a Vertical Gate-All-around DRAM Access Transistor with an Open-source TCAD Workflow

Tee Hui Teo

Published
Publisher
Elsevier BV
Research area
Semiconductors
Source type
Preprint / posted paper
DOI
10.2139/ssrn.7535038

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Tee Hui Teo. Spec-driven Design and Verification of a Vertical Gate-All-around DRAM Access Transistor with an Open-source TCAD Workflow. Elsevier BV. 2026. https://doi.org/10.2139/ssrn.7535038

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