Sputtered N-doped (Al,Zr,Ti,Ta,Hf)Ox dielectric layers for high-performance thin-film transistor-based UV photodetectors
Van Dung Nguyen; Chia-Yu Liang; Takahiro Nagata; Huu Duc Luong; Kao-Shuo Chang
- Published
- Publisher
- Elsevier BV
- Journal / collection
- Journal of Alloys and Compounds
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1016/j.jallcom.2026.186359
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Cite this source
Van Dung Nguyen; Chia-Yu Liang; Takahiro Nagata; Huu Duc Luong; Kao-Shuo Chang. Sputtered N-doped (Al,Zr,Ti,Ta,Hf)Ox dielectric layers for high-performance thin-film transistor-based UV photodetectors. Journal of Alloys and Compounds. 2026-02. https://doi.org/10.1016/j.jallcom.2026.186359