High-K, Gate-Stack Engineered, Junctionless, Nanowire Ferroelectric Field Effect Transistor (J-NW-Fe-Fet) with various catalytic metals for PH3 Sensing Applications
Shalu Garg; Jasdeep Kaur; Anubha Goel; Subhasis Haldar; R. S. Gupta
- Published
- Publisher
- IEEE
- Journal / collection
- 2025 Devices for Integrated Circuit (DevIC)
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1109/devic63749.2025.11012326
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Cite this source
Shalu Garg; Jasdeep Kaur; Anubha Goel; Subhasis Haldar; R. S. Gupta. High-K, Gate-Stack Engineered, Junctionless, Nanowire Ferroelectric Field Effect Transistor (J-NW-Fe-Fet) with various catalytic metals for PH3 Sensing Applications. 2025 Devices for Integrated Circuit (DevIC). 2025-04-05. https://doi.org/10.1109/devic63749.2025.11012326