Biaxial membrane stress evolution during pellicle mounting and stabilization in semiconductor manufacturing
Yu Ching Lee; Nai Hsiang Hsing; Yu Xiang Zhang; Yen Chun Lo; You En Lin
- Published
- Publisher
- Elsevier BV
- Journal / collection
- Measurement
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1016/j.measurement.2026.120880
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Cite this source
Yu Ching Lee; Nai Hsiang Hsing; Yu Xiang Zhang; Yen Chun Lo; You En Lin. Biaxial membrane stress evolution during pellicle mounting and stabilization in semiconductor manufacturing. Measurement. 2026-04. https://doi.org/10.1016/j.measurement.2026.120880