Advancements and challenges in large-scale atomic force microscopy image stitching for semiconductor devices
Julien Baderot; Ali Hallal; Matthew Tedaldi; Richard Thomas; Andrew D. L. Humphris; Johann Foucher
- Published
- Publisher
- SPIE
- Journal / collection
- Metrology, Inspection, and Process Control XL
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1117/12.3090762
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Cite this source
Julien Baderot; Ali Hallal; Matthew Tedaldi; Richard Thomas; Andrew D. L. Humphris; Johann Foucher. Advancements and challenges in large-scale atomic force microscopy image stitching for semiconductor devices. Metrology, Inspection, and Process Control XL. 2026-04-08. https://doi.org/10.1117/12.3090762