Contact engineering of metallic Ni-integrated niobium sulfide via H2S treatment for enhanced MoS2 transistor performance and CMOS compatibility
Koki Hori; Wen Hsin Chang; Toshifumi Irisawa; Atsushi Ogura; Naoya Okada
- Published
- Publisher
- Springer Science and Business Media LLC
- Journal / collection
- Scientific Reports
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1038/s41598-026-41610-3
The original publisher provides the full text and its access options.
Cite this source
Koki Hori; Wen Hsin Chang; Toshifumi Irisawa; Atsushi Ogura; Naoya Okada. Contact engineering of metallic Ni-integrated niobium sulfide via H2S treatment for enhanced MoS2 transistor performance and CMOS compatibility. Scientific Reports. 2026-03-08. https://doi.org/10.1038/s41598-026-41610-3