EUV exposure for photo-chemical materials and LPP-EUV source research for semiconductor manufacturing I
Hakaru Mizoguchi; Kentaro Tomita; Daisuke Nakamura; Yukihiro Yamagata; Takeshi Higashiguchi; Atsushi Sunahara; Katsunobu Nishihara; Takashi Toshima; Hiroki Kondo; Takuji Sakamoto; Tanemasa Asano; Masaharu Shiratani
- Published
- Publisher
- SPIE
- Journal / collection
- Optical and EUV Nanolithography XXXIX
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1117/12.3088662
The original publisher provides the full text and its access options.
Cite this source
Hakaru Mizoguchi; Kentaro Tomita; Daisuke Nakamura; Yukihiro Yamagata; Takeshi Higashiguchi; Atsushi Sunahara; Katsunobu Nishihara; Takashi Toshima; Hiroki Kondo; Takuji Sakamoto; Tanemasa Asano; Masaharu Shiratani. EUV exposure for photo-chemical materials and LPP-EUV source research for semiconductor manufacturing I. Optical and EUV Nanolithography XXXIX. 2026-04-20. https://doi.org/10.1117/12.3088662