Optimization of lateral source/drain growth profile for improving RC delay in nanosheet field-effect transistor
Jin Ho Park; Jae Woog Jung; Hyunwoo Kim
- Published
- Publisher
- Elsevier BV
- Journal / collection
- Solid-State Electronics
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1016/j.sse.2025.109227
The original publisher provides the full text and its access options.
Cite this source
Jin Ho Park; Jae Woog Jung; Hyunwoo Kim. Optimization of lateral source/drain growth profile for improving RC delay in nanosheet field-effect transistor. Solid-State Electronics. 2025-12. https://doi.org/10.1016/j.sse.2025.109227