Quantitative Single-Particle Analysis: Plasmon Damping Modulation via Interfacial Engineering in Metal–Semiconductor Matchstick Heterostructures
Rafifah Hana Raihana Syam; Yola Yolanda Alizar; Ji Won Ha
- Published
- Publisher
- American Chemical Society (ACS)
- Journal / collection
- Analytical Chemistry
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1021/acs.analchem.6c00492
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Cite this source
Rafifah Hana Raihana Syam; Yola Yolanda Alizar; Ji Won Ha. Quantitative Single-Particle Analysis: Plasmon Damping Modulation via Interfacial Engineering in Metal–Semiconductor Matchstick Heterostructures. Analytical Chemistry. 2026-05-13. https://doi.org/10.1021/acs.analchem.6c00492