Plasma dynamics and future of LPP-EUV source for semiconductor manufacturing
Hakaru Mizoguchi; Kentaro Tomita; Daisuke Nakamura; Yukihiro Yamagata; Takeshi Higashiguchi; Atsushi Sunahara; Katsunobu Nishihara; Takashi Toshima; Hiroki Kondo; Takuji Sakamoto; Tanemasa Asano; Masaharu Shiratani
- Published
- Publisher
- SPIE
- Journal / collection
- International Conference on Extreme Ultraviolet Lithography 2025
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1117/12.3072223
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Hakaru Mizoguchi; Kentaro Tomita; Daisuke Nakamura; Yukihiro Yamagata; Takeshi Higashiguchi; Atsushi Sunahara; Katsunobu Nishihara; Takashi Toshima; Hiroki Kondo; Takuji Sakamoto; Tanemasa Asano; Masaharu Shiratani. Plasma dynamics and future of LPP-EUV source for semiconductor manufacturing. International Conference on Extreme Ultraviolet Lithography 2025. 2025-11-06. https://doi.org/10.1117/12.3072223