Amorphous High-κ Dielectrics for Top-Gate Integration in 2D Semiconductor Transistors
Jinbao Jiang; Yuhang Wang; Chengmiao Liu; Yuting He; Jiangwei Zhang; Biyuan Zheng; Feng Xiong; Hansheng Li; Susu Qiu; Chucai Guo; Zhihong Zhu
- Published
- Publisher
- Springer Science and Business Media LLC
- Research area
- Semiconductors
- Source type
- Preprint / posted paper
- DOI
- 10.21203/rs.3.rs-10511400/v1
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Cite this source
Jinbao Jiang; Yuhang Wang; Chengmiao Liu; Yuting He; Jiangwei Zhang; Biyuan Zheng; Feng Xiong; Hansheng Li; Susu Qiu; Chucai Guo; Zhihong Zhu. Amorphous High-κ Dielectrics for Top-Gate Integration in 2D Semiconductor Transistors. Springer Science and Business Media LLC. 2026-08-21. https://doi.org/10.21203/rs.3.rs-10511400/v1