Removal of isopropyl alcohol (IPA) in a semiconductor facility using ozone catalytic oxidation
Kuan-Lun Pan; Pei-Yun Shih; Zhen-Shuen Choo; Jo-Chen Hsu; Keh-Perng Shen
- Published
- Publisher
- EDP Sciences
- Journal / collection
- E3S Web of Conferences
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1051/e3sconf/202671601066
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Cite this source
Kuan-Lun Pan; Pei-Yun Shih; Zhen-Shuen Choo; Jo-Chen Hsu; Keh-Perng Shen. Removal of isopropyl alcohol (IPA) in a semiconductor facility using ozone catalytic oxidation. E3S Web of Conferences. 2026. https://doi.org/10.1051/e3sconf/202671601066