Back-End-Of-Line Compatible Indium Oxide Thin-Film Transistor Enabling Cryogenic Operation Down to 2 Kelvin
Na Xiao; Vishal Khandelwal; Kumar Mritunjay; Saravanan Yuvaraja; Zhiyuan Liu; Zixian Jiang; Thomas Anthopoulos; Xiaohang Li
- Published
- Publisher
- Elsevier BV
- Research area
- Semiconductors
- Source type
- Preprint / posted paper
- DOI
- 10.2139/ssrn.5279661
This is a preprint or other posted paper. Check the original source for its review and publication status.
The original publisher provides the full text and its access options.
Cite this source
Na Xiao; Vishal Khandelwal; Kumar Mritunjay; Saravanan Yuvaraja; Zhiyuan Liu; Zixian Jiang; Thomas Anthopoulos; Xiaohang Li. Back-End-Of-Line Compatible Indium Oxide Thin-Film Transistor Enabling Cryogenic Operation Down to 2 Kelvin. Elsevier BV. 2025. https://doi.org/10.2139/ssrn.5279661