Performance Analysis of Advanced Ferroelectric $\text{HfO}_{2}-\text{ZrO}_{2}$ Superlattice Gate Stack Transistor with Multi-Phase Ferroelectric Order
Danish Raja; Yogendra Machhiwar; Karunesh Kumar Tripathi; Girish Pahwa; Harshit Agarwal
- Published
- Publisher
- IEEE
- Journal / collection
- 2025 9th IEEE Electron Devices Technology & Manufacturing Conference (EDTM)
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1109/edtm61175.2025.11040864
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Cite this source
Danish Raja; Yogendra Machhiwar; Karunesh Kumar Tripathi; Girish Pahwa; Harshit Agarwal. Performance Analysis of Advanced Ferroelectric $\text{HfO}_{2}-\text{ZrO}_{2}$ Superlattice Gate Stack Transistor with Multi-Phase Ferroelectric Order. 2025 9th IEEE Electron Devices Technology & Manufacturing Conference (EDTM). 2025-03-09. https://doi.org/10.1109/edtm61175.2025.11040864