Compositionally engineered amorphous InZnO thin-film transistor with high mobility and stability via atmospheric pressure spatial atomic layer deposition
Chi-Hoon Lee; Kwang Su Yoo; Dong-Gyu Kim; Chang-Kyun Park; Jin-Seong Park
- Published
- Publisher
- Elsevier BV
- Journal / collection
- Journal of Industrial and Engineering Chemistry
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1016/j.jiec.2024.05.046
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Cite this source
Chi-Hoon Lee; Kwang Su Yoo; Dong-Gyu Kim; Chang-Kyun Park; Jin-Seong Park. Compositionally engineered amorphous InZnO thin-film transistor with high mobility and stability via atmospheric pressure spatial atomic layer deposition. Journal of Industrial and Engineering Chemistry. 2024-12. https://doi.org/10.1016/j.jiec.2024.05.046