Interface trap-induced radiofrequency and low-frequency noise analysis under temperature variation of a heterostacked source L-gate tunnel field effect transistor
Debika Das; Ujjal Chakraborty; Pranjal Borah
- Published
- Publisher
- IOP Publishing
- Journal / collection
- Semiconductor Science and Technology
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1088/1361-6641/ad5466
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Cite this source
Debika Das; Ujjal Chakraborty; Pranjal Borah. Interface trap-induced radiofrequency and low-frequency noise analysis under temperature variation of a heterostacked source L-gate tunnel field effect transistor. Semiconductor Science and Technology. 2024-07-04. https://doi.org/10.1088/1361-6641/ad5466