Effectuality of frequency dependent dielectric characterization of (N:DLC) film deposition between the metal-semiconductor interface
N. Urgun; S.O. Tan; A. Feizollahi Vahid; B. Avar; Ş. Altındal
- Published
- Publisher
- Elsevier BV
- Journal / collection
- Physica B: Condensed Matter
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1016/j.physb.2024.416753
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Cite this source
N. Urgun; S.O. Tan; A. Feizollahi Vahid; B. Avar; Ş. Altındal. Effectuality of frequency dependent dielectric characterization of (N:DLC) film deposition between the metal-semiconductor interface. Physica B: Condensed Matter. 2025-02. https://doi.org/10.1016/j.physb.2024.416753