51‐1: Invited Paper: Optimizing Photonic Annealing Technique for Full‐Solution‐Processed Oxide Thin Film Transistor
Meng Xu; Xifeng Li
- Published
- Publisher
- Wiley
- Journal / collection
- SID Symposium Digest of Technical Papers
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1002/sdtp.17108
The original publisher provides the full text and its access options.
Cite this source
Meng Xu; Xifeng Li. 51‐1: Invited Paper: Optimizing Photonic Annealing Technique for Full‐Solution‐Processed Oxide Thin Film Transistor. SID Symposium Digest of Technical Papers. 2024-04. https://doi.org/10.1002/sdtp.17108