A Two‐Step Dry Etching Model for Non‐Uniform Etching Profile in Gate‐All‐Around Field‐Effect Transistor Manufacturing
Ziyi Hu; Junjie Li; Rui Chen; Dashan Shang; Yayi Wei; Zhongrui Wang; Ling Li; Lado Filipovic
- Published
- Publisher
- Wiley
- Journal / collection
- Small
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1002/smll.202405574
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Cite this source
Ziyi Hu; Junjie Li; Rui Chen; Dashan Shang; Yayi Wei; Zhongrui Wang; Ling Li; Lado Filipovic. A Two‐Step Dry Etching Model for Non‐Uniform Etching Profile in Gate‐All‐Around Field‐Effect Transistor Manufacturing. Small. 2024-10-11. https://doi.org/10.1002/smll.202405574