(Invited) High Performance Metal Oxide Thin Film Transistor Using ALD Technology
Takanori Takahashi; Yukiharu Uraoka
- Published
- Publisher
- The Electrochemical Society
- Journal / collection
- ECS Meeting Abstracts
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1149/ma2024-02342399mtgabs
The original publisher provides the full text and its access options.
Cite this source
Takanori Takahashi; Yukiharu Uraoka. (Invited) High Performance Metal Oxide Thin Film Transistor Using ALD Technology. ECS Meeting Abstracts. 2024-11-22. https://doi.org/10.1149/ma2024-02342399mtgabs