A Self-aligned Process for Simultaneous Fabrication of Short Channel and Spacer in Semiconductor Devices
Jong-Kyung Park; Seul-Ki Hong
- Published
- Publisher
- The Institute of Electronics Engineers of Korea
- Journal / collection
- JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.5573/jsts.2024.06.24.3.179
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Cite this source
Jong-Kyung Park; Seul-Ki Hong. A Self-aligned Process for Simultaneous Fabrication of Short Channel and Spacer in Semiconductor Devices. JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE. 2024-06-30. https://doi.org/10.5573/jsts.2024.06.24.3.179