AI-powered deconvolution-based super-resolution imaging for semiconductor OCD metrology and precise stage positioning
Yu-Ting Cheng; Wei-Yun Lee; Ming-Jie Liu; Wei-Hsin Chein; Liang-Chia Chen
- Published
- Publisher
- SPIE
- Journal / collection
- Metrology, Inspection, and Process Control XXXVIII
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1117/12.3010986
The original publisher provides the full text and its access options.
Cite this source
Yu-Ting Cheng; Wei-Yun Lee; Ming-Jie Liu; Wei-Hsin Chein; Liang-Chia Chen. AI-powered deconvolution-based super-resolution imaging for semiconductor OCD metrology and precise stage positioning. Metrology, Inspection, and Process Control XXXVIII. 2024-04-10. https://doi.org/10.1117/12.3010986