A review of calibration standards, devices and methods for gas flow in semiconductor manufacturing processes
Gaoming Zhang; Boxu Hui; Zhipeng Xu; Bin Zhou; Bengt Sundén; Zhen Cao
- Published
- Publisher
- Elsevier BV
- Journal / collection
- Flow Measurement and Instrumentation
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1016/j.flowmeasinst.2024.102753
The original publisher provides the full text and its access options.
Cite this source
Gaoming Zhang; Boxu Hui; Zhipeng Xu; Bin Zhou; Bengt Sundén; Zhen Cao. A review of calibration standards, devices and methods for gas flow in semiconductor manufacturing processes. Flow Measurement and Instrumentation. 2025-01. https://doi.org/10.1016/j.flowmeasinst.2024.102753