Multiscale Characterization of Hydrogen Plasma-Induced Defects in Semiconductor Materials
Ashok Ranjan; Ching-Shan Sung; Bi-Jen Chen
- Published
- Publisher
- ASM International
- Journal / collection
- International Symposium for Testing and Failure Analysis
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.31399/asm.cp.istfa2026p0382
The original publisher provides the full text and its access options.
Cite this source
Ashok Ranjan; Ching-Shan Sung; Bi-Jen Chen. Multiscale Characterization of Hydrogen Plasma-Induced Defects in Semiconductor Materials. International Symposium for Testing and Failure Analysis. 2026-10-04. https://doi.org/10.31399/asm.cp.istfa2026p0382