Designing Topology and Fractionalization in Narrow Gap Semiconductor Films via Electrostatic Engineering
Tixuan Tan; Aidan P. Reddy; Liang Fu; Trithep Devakul
- Published
- Publisher
- American Physical Society (APS)
- Journal / collection
- Physical Review Letters
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1103/physrevlett.133.206601
The original publisher provides the full text and its access options.
Cite this source
Tixuan Tan; Aidan P. Reddy; Liang Fu; Trithep Devakul. Designing Topology and Fractionalization in Narrow Gap Semiconductor Films via Electrostatic Engineering. Physical Review Letters. 2024-11-12. https://doi.org/10.1103/physrevlett.133.206601