Degradation behaviors and mechanisms of perfluoroelastomers exposed to a high-temperature chlorine-containing environment for semiconductor dry etching equipment
Fandi Meng; Xiaolong Wen; Shucheng Ren; Peng Sun; Tao Zhang; Fuhui Wang; Li Liu
- Published
- Publisher
- Elsevier BV
- Journal / collection
- Polymer Degradation and Stability
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1016/j.polymdegradstab.2026.112322
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Cite this source
Fandi Meng; Xiaolong Wen; Shucheng Ren; Peng Sun; Tao Zhang; Fuhui Wang; Li Liu. Degradation behaviors and mechanisms of perfluoroelastomers exposed to a high-temperature chlorine-containing environment for semiconductor dry etching equipment. Polymer Degradation and Stability. 2026-10. https://doi.org/10.1016/j.polymdegradstab.2026.112322