EUV patterned gate variation reduction in next generation transistor architectures
Gopal Sankar Kenath; Martin Burkhardt; Nikhil Jain; Anna Lin; Jennifer Church; Gen Tsutsui; Stephanie Reynoso; Xuan Liu; Chris Sheraw; Pietro Montanini; Eric Miller; Indira Seshadri; Luciana Meli; Nelson Felix
- Published
- Publisher
- SPIE
- Journal / collection
- Optical and EUV Nanolithography XXXVII
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1117/12.3012023
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Cite this source
Gopal Sankar Kenath; Martin Burkhardt; Nikhil Jain; Anna Lin; Jennifer Church; Gen Tsutsui; Stephanie Reynoso; Xuan Liu; Chris Sheraw; Pietro Montanini; Eric Miller; Indira Seshadri; Luciana Meli; Nelson Felix. EUV patterned gate variation reduction in next generation transistor architectures. Optical and EUV Nanolithography XXXVII. 2024-04-10. https://doi.org/10.1117/12.3012023