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A Novel 2-Tier Stacked Vertical Channel GAA Transistor Architecture with Area-Saving 3-Dimensional Local Interconnect to Achieve Gb-Density 6T SRAM with Acceptable Low Standby Chip Leakage (~1mA)

Hang-Ting Lue; Weichen Chen; Teng-Hao Yeh; Keh-Chung Wang; Chih-Yuan Lu

Published
Publisher
IEEE
Journal / collection
2024 IEEE Silicon Nanoelectronics Workshop (SNW)
Research area
Semiconductors
Source type
Conference paper
DOI
10.1109/snw63608.2024.10639203

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Hang-Ting Lue; Weichen Chen; Teng-Hao Yeh; Keh-Chung Wang; Chih-Yuan Lu. A Novel 2-Tier Stacked Vertical Channel GAA Transistor Architecture with Area-Saving 3-Dimensional Local Interconnect to Achieve Gb-Density 6T SRAM with Acceptable Low Standby Chip Leakage (~1mA). 2024 IEEE Silicon Nanoelectronics Workshop (SNW). 2024-06-15. https://doi.org/10.1109/snw63608.2024.10639203

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