Analysis of a novel Si1-xGex/Si heterojunction stacked oxide double-gate tunnel field-effect transistor with asymmetry structure for improved DC and analog/RF performance
Qing Chen; Lulu Yang; Jianwei Li; Hanxiao Liu; Zengwei Qi; Xiaofeng Yang; Dong Chen; Wei He
- Published
- Publisher
- Elsevier BV
- Journal / collection
- Micro and Nanostructures
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1016/j.micrna.2023.207722
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Cite this source
Qing Chen; Lulu Yang; Jianwei Li; Hanxiao Liu; Zengwei Qi; Xiaofeng Yang; Dong Chen; Wei He. Analysis of a novel Si1-xGex/Si heterojunction stacked oxide double-gate tunnel field-effect transistor with asymmetry structure for improved DC and analog/RF performance. Micro and Nanostructures. 2024-01. https://doi.org/10.1016/j.micrna.2023.207722