High Performance All-2D Te Field Effect Transistor with Layer-engineered Homojunction using Sputtering Deposition
Byungjin Cho; Min Jeong Kim; Ojun Kwon; Seyoung Oh; Eunjeong Cho; Wondeok Seo; Yeongeun Kwon; Shinhoi Kim; Minhee Kim; Kyungmin Lee; Minyoung Choi; Ah Ra Kim; Jongwon Yoon; Woojin Park
- Published
- Publisher
- Elsevier BV
- Research area
- Semiconductors
- Source type
- Preprint / posted paper
- DOI
- 10.2139/ssrn.5611947
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Cite this source
Byungjin Cho; Min Jeong Kim; Ojun Kwon; Seyoung Oh; Eunjeong Cho; Wondeok Seo; Yeongeun Kwon; Shinhoi Kim; Minhee Kim; Kyungmin Lee; Minyoung Choi; Ah Ra Kim; Jongwon Yoon; Woojin Park. High Performance All-2D Te Field Effect Transistor with Layer-engineered Homojunction using Sputtering Deposition. Elsevier BV. 2025. https://doi.org/10.2139/ssrn.5611947