An overview of semiconductor industry efforts to reduce PFAS use and emissions in plasma processes
Laurie S. Beu; Melissa A. Gresham
- Published
- Publisher
- SPIE
- Journal / collection
- Advanced Etch Technology and Process Integration for Nanopatterning XIII
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1117/12.3013226
The original publisher provides the full text and its access options.
Cite this source
Laurie S. Beu; Melissa A. Gresham. An overview of semiconductor industry efforts to reduce PFAS use and emissions in plasma processes. Advanced Etch Technology and Process Integration for Nanopatterning XIII. 2024-04-09. https://doi.org/10.1117/12.3013226