Study of dielectric properties in stacked high-k dielectric metal oxide semiconductor capacitor (MOSCAP) devices
Makhes K. Behera; Kelsea A. Yarbrough; Messaoud Bahoura
- Published
- Publisher
- Springer Science and Business Media LLC
- Journal / collection
- Journal of Materials Science: Materials in Electronics
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1007/s10854-024-13031-3
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Cite this source
Makhes K. Behera; Kelsea A. Yarbrough; Messaoud Bahoura. Study of dielectric properties in stacked high-k dielectric metal oxide semiconductor capacitor (MOSCAP) devices. Journal of Materials Science: Materials in Electronics. 2024-07. https://doi.org/10.1007/s10854-024-13031-3