Total resource circulation in chemical mechanical polishing wastewater treatment from semiconductor manufacturing industry: A review
Bi-Cheng Chang; Hsing-Jung Ho; Atsushi Iizuka
- Published
- Publisher
- Elsevier BV
- Journal / collection
- Journal of Water Process Engineering
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1016/j.jwpe.2025.107619
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Cite this source
Bi-Cheng Chang; Hsing-Jung Ho; Atsushi Iizuka. Total resource circulation in chemical mechanical polishing wastewater treatment from semiconductor manufacturing industry: A review. Journal of Water Process Engineering. 2025-04. https://doi.org/10.1016/j.jwpe.2025.107619