Patterning of layered semiconductor GeS 2 by laser photooxidation and water immersion
Shohi Tahara; Keiji Ueno; Koki Kamiya; Taiga Sakai; Ryo Nouchi
- Published
- Publisher
- Royal Society of Chemistry (RSC)
- Journal / collection
- Nanoscale
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1039/d5nr01130b
The original publisher provides the full text and its access options.
Cite this source
Shohi Tahara; Keiji Ueno; Koki Kamiya; Taiga Sakai; Ryo Nouchi. Patterning of layered semiconductor GeS 2 by laser photooxidation and water immersion. Nanoscale. 2025. https://doi.org/10.1039/d5nr01130b