Atomic layer deposition of oxide semiconductor thin films for transistor applications: a review
Inhong Hwang; Minki Choe; Dahui Jeon; In-Hwan Baek
- Published
- Publisher
- Royal Society of Chemistry (RSC)
- Journal / collection
- Journal of Materials Chemistry C
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1039/d4tc03452j
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Cite this source
Inhong Hwang; Minki Choe; Dahui Jeon; In-Hwan Baek. Atomic layer deposition of oxide semiconductor thin films for transistor applications: a review. Journal of Materials Chemistry C. 2024. https://doi.org/10.1039/d4tc03452j