SLowFlowS: A novel flow standard for semiconductor process gases
J.G. Pope; K.A. Gillis; A.N. Johnson; J.T. Boyd; J.D. Wright
- Published
- Publisher
- Elsevier BV
- Journal / collection
- Flow Measurement and Instrumentation
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1016/j.flowmeasinst.2025.102831
The original publisher provides the full text and its access options.
Cite this source
J.G. Pope; K.A. Gillis; A.N. Johnson; J.T. Boyd; J.D. Wright. SLowFlowS: A novel flow standard for semiconductor process gases. Flow Measurement and Instrumentation. 2025-03. https://doi.org/10.1016/j.flowmeasinst.2025.102831