ELECTRICAL CHARACTERIZATION OF GATE-ALL-AROUND FIELD-EFFECT TRANSISTOR WITH HZO AND HfO2 FERROELECTRICS
Belarusian State University of Informatics and Radioelectronics; I.Yu. Lovshenko; V.S. Volcheck; Belarusian State University of Informatics and Radioelectronics; P.E. Novikov; Belarusian State University of Informatics and Radioelectronics; K.O. Volchhik; Belarusian State University of Informatics and Radioelectronics
- Published
- Publisher
- Ulyanovsk State Technical University
- Journal / collection
- Materials of the 27th All-Russian Youth Scientific Conference
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.61527/appfe-2024.240-242
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Cite this source
Belarusian State University of Informatics and Radioelectronics; I.Yu. Lovshenko; V.S. Volcheck; Belarusian State University of Informatics and Radioelectronics; P.E. Novikov; Belarusian State University of Informatics and Radioelectronics; K.O. Volchhik; Belarusian State University of Informatics and Radioelectronics. ELECTRICAL CHARACTERIZATION OF GATE-ALL-AROUND FIELD-EFFECT TRANSISTOR WITH HZO AND HfO2 FERROELECTRICS. Materials of the 27th All-Russian Youth Scientific Conference. 2024-10-21. https://doi.org/10.61527/appfe-2024.240-242