Semiconductor WO3 thin films deposited by pulsed reactive magnetron sputtering
A. Písaříková; H. Krýsová; A. Kapran; P. Písařík; M. Čada; J. Olejníček; R. Hippler; Z. Hubička
- Published
- Publisher
- Elsevier BV
- Journal / collection
- Materials Science in Semiconductor Processing
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1016/j.mssp.2024.109034
The original publisher provides the full text and its access options.
Cite this source
A. Písaříková; H. Krýsová; A. Kapran; P. Písařík; M. Čada; J. Olejníček; R. Hippler; Z. Hubička. Semiconductor WO3 thin films deposited by pulsed reactive magnetron sputtering. Materials Science in Semiconductor Processing. 2025-02. https://doi.org/10.1016/j.mssp.2024.109034