Correlative In-Situ AFM-in-SEM Technique for Advanced Semiconductor Failure Analysis and Material Characterization (2026 Update)
Jan Neuman; Radek Dao; Ondřej Novotný; Rosalinda Ring; Jamie Gravell; Libor Strakoš; Adam Stokes; Umberto Celano; Ashiqur Rahman Laskar; Willy Lim; Guillaume Boetsch
- Published
- Publisher
- ASM International
- Journal / collection
- International Symposium for Testing and Failure Analysis
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.31399/asm.cp.istfa2026tp00n1
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Cite this source
Jan Neuman; Radek Dao; Ondřej Novotný; Rosalinda Ring; Jamie Gravell; Libor Strakoš; Adam Stokes; Umberto Celano; Ashiqur Rahman Laskar; Willy Lim; Guillaume Boetsch. Correlative In-Situ AFM-in-SEM Technique for Advanced Semiconductor Failure Analysis and Material Characterization (2026 Update). International Symposium for Testing and Failure Analysis. 2026-10-04. https://doi.org/10.31399/asm.cp.istfa2026tp00n1