Study of 589nm GaInP quantum well semiconductor laser on Ge/SiGe substrate
Jianan Xie; Tao Lin; Cailin Wang; Jiahao Shi; Chaoyang Xie; Duo Liang; Yupeng Duan
- Published
- Publisher
- Springer Science and Business Media LLC
- Journal / collection
- Applied Physics B
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1007/s00340-023-08164-y
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Cite this source
Jianan Xie; Tao Lin; Cailin Wang; Jiahao Shi; Chaoyang Xie; Duo Liang; Yupeng Duan. Study of 589nm GaInP quantum well semiconductor laser on Ge/SiGe substrate. Applied Physics B. 2024-01-10. https://doi.org/10.1007/s00340-023-08164-y