High-precision laser confocal measurement of semiconductor wafer thickness
Zhaoyu LI; 北京理工大学 光电学院 复杂环境智能感测技术工信部重点实验室，北京 100081 MIIT Key Laboratory of Complex-field Intelligent Exploration， Beijing Institute of Technology， School of Optics and Photonics， Beijing Institute of Technology， Beijing 100081， China; Zihao LIU; Yaoying WANG; Lirong QIU; Shuai YANG
- Published
- Publisher
- Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences
- Journal / collection
- Optics and Precision Engineering
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.37188/ope.20243207.0956
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Cite this source
Zhaoyu LI; 北京理工大学 光电学院 复杂环境智能感测技术工信部重点实验室，北京 100081 MIIT Key Laboratory of Complex-field Intelligent Exploration， Beijing Institute of Technology， School of Optics and Photonics， Beijing Institute of Technology， Beijing 100081， China; Zihao LIU; Yaoying WANG; Lirong QIU; Shuai YANG. High-precision laser confocal measurement of semiconductor wafer thickness. Optics and Precision Engineering. 2024. https://doi.org/10.37188/ope.20243207.0956