Oxygen Incorporation as a Route to Nondegenerate Zinc Nitride Semiconductor Thin Films
Elise Sirotti; Bianca Scaparra; Stefan Böhm; Florian Pantle; Laura I. Wagner; Felix Rauh; Frans Munnik; Chang-Ming Jiang; Matthias Kuhl; Kai Müller; Johanna Eichhorn; Verena Streibel; Ian D. Sharp
- Published
- Publisher
- American Chemical Society (ACS)
- Journal / collection
- ACS Applied Materials & Interfaces
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1021/acsami.4c16921
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Cite this source
Elise Sirotti; Bianca Scaparra; Stefan Böhm; Florian Pantle; Laura I. Wagner; Felix Rauh; Frans Munnik; Chang-Ming Jiang; Matthias Kuhl; Kai Müller; Johanna Eichhorn; Verena Streibel; Ian D. Sharp. Oxygen Incorporation as a Route to Nondegenerate Zinc Nitride Semiconductor Thin Films. ACS Applied Materials & Interfaces. 2025-01-28. https://doi.org/10.1021/acsami.4c16921