Virtual metrology in semiconductor manufacturing: Current status and future prospects
Varad Maitra; Yutai Su; Jing Shi
- Published
- Publisher
- Elsevier BV
- Journal / collection
- Expert Systems with Applications
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1016/j.eswa.2024.123559
The original publisher provides the full text and its access options.
Cite this source
Varad Maitra; Yutai Su; Jing Shi. Virtual metrology in semiconductor manufacturing: Current status and future prospects. Expert Systems with Applications. 2024-09. https://doi.org/10.1016/j.eswa.2024.123559