Thermal Crosstalk Analysis in Advanced CMOS Circuits: Insights from 3nm Gate-All-Around Transistor Technology
Sihao Chen; Honglin Wu; Runsheng Wang; Ru Huang; Lining Zhang
- Published
- Publisher
- IEEE
- Journal / collection
- 2025 9th IEEE Electron Devices Technology & Manufacturing Conference (EDTM)
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1109/edtm61175.2025.11040984
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Cite this source
Sihao Chen; Honglin Wu; Runsheng Wang; Ru Huang; Lining Zhang. Thermal Crosstalk Analysis in Advanced CMOS Circuits: Insights from 3nm Gate-All-Around Transistor Technology. 2025 9th IEEE Electron Devices Technology & Manufacturing Conference (EDTM). 2025-03-09. https://doi.org/10.1109/edtm61175.2025.11040984