Low temperature plasma deposited SiO2/organosilicon stacked film for transparent gate dielectric of InGaZnO thin film transistor
Chong Peng; Houyun Qin; Yiming Liu; Yiyang Chang; Kaiyuan Liu; Jiarui Guo; Yi Zhao
- Published
- Publisher
- Elsevier BV
- Journal / collection
- Thin Solid Films
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1016/j.tsf.2023.140174
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Cite this source
Chong Peng; Houyun Qin; Yiming Liu; Yiyang Chang; Kaiyuan Liu; Jiarui Guo; Yi Zhao. Low temperature plasma deposited SiO2/organosilicon stacked film for transparent gate dielectric of InGaZnO thin film transistor. Thin Solid Films. 2024-01. https://doi.org/10.1016/j.tsf.2023.140174