Ecofriendly silicon dioxide chemical vapor deposition for semiconductor devices using nitrogen monoxide gas source
Yeojin Jeong; Minh Phuong Nguyen; Jang-Kun Song; Yong-Sang Kim; Yung-Bin Chung; Woo-Seok Jeon; Jungyun Jo; Youngkuk Kim; Duy Phong Pham; Junsin Yi
- Published
- Publisher
- Elsevier BV
- Journal / collection
- Optical Materials
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1016/j.optmat.2024.114970
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Cite this source
Yeojin Jeong; Minh Phuong Nguyen; Jang-Kun Song; Yong-Sang Kim; Yung-Bin Chung; Woo-Seok Jeon; Jungyun Jo; Youngkuk Kim; Duy Phong Pham; Junsin Yi. Ecofriendly silicon dioxide chemical vapor deposition for semiconductor devices using nitrogen monoxide gas source. Optical Materials. 2024-02. https://doi.org/10.1016/j.optmat.2024.114970