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Research literature / Conference paper

Semiconductor Traceability: Die Annotations Patterning by Maskless Exposure Technology

K. Varga; R. Holly; T. Zenger; A. Spitzer; F. Bögelsack; T. Uhrmann; S. Vanclooster; M. Reybrouck; D. Janssen; N. Van Herck; M. Vandevyvere

Published
Publisher
IEEE
Journal / collection
2024 International VLSI Symposium on Technology, Systems and Applications (VLSI TSA)
Research area
Semiconductors
Source type
Conference paper
DOI
10.1109/vlsitsa60681.2024.10546369

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K. Varga; R. Holly; T. Zenger; A. Spitzer; F. Bögelsack; T. Uhrmann; S. Vanclooster; M. Reybrouck; D. Janssen; N. Van Herck; M. Vandevyvere. Semiconductor Traceability: Die Annotations Patterning by Maskless Exposure Technology. 2024 International VLSI Symposium on Technology, Systems and Applications (VLSI TSA). 2024-04-22. https://doi.org/10.1109/vlsitsa60681.2024.10546369

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