Extraction of interfacial thermal resistance across an organic/semiconductor interface using optical-interference contactless thermometry
Jiawen Yu; Hiroaki Hanafusa; Seiichiro Higashi
- Published
- Publisher
- IOP Publishing
- Journal / collection
- Applied Physics Express
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.35848/1882-0786/ad2b01
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Cite this source
Jiawen Yu; Hiroaki Hanafusa; Seiichiro Higashi. Extraction of interfacial thermal resistance across an organic/semiconductor interface using optical-interference contactless thermometry. Applied Physics Express. 2024-03-01. https://doi.org/10.35848/1882-0786/ad2b01